Global Photomask Inspection Market 2017-2021

フォトマスク検査の世界市場2017-2021

◆タイトル:Global Photomask Inspection Market 2017-2021
◆商品コード:IRTNTR12610
◆調査・発行会社:Technavio (Infiniti Research Ltd.)
◆発行日:2017年4月19日
◆ページ数:70
◆資料形式:PDF / 英語
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◆調査対象地域:グローバル
◆産業分野:電子
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【資料の概要】

当調査レポートでは、フォトマスク検査の世界市場について調査・分析し、エグゼクティブサマリー、市場概観、市場概観、業界の構造分析、フォトマスク検査の世界市場規模及び予測、技術別分析、需要先別分析、地域別分析/市場規模、主要国別分析、市場の成長要因、市場の課題、市場動向、競争状況、主要企業(ベンダー)分析などの情報をお届けいたします。

ABSTRACTAbout Photomask Inspection

Mask inspection or photomask inspection is an operation of checking the accuracy of fabricated photomasks that are used in semiconductor device fabrication. In the semiconductor industry, photomask inspection is a series of electronic data that lays the foundation for lithography steps of the semiconductor device fabrication process. Photomask inspection is a method used before lithography to inspect photomasks for defects during the production of semiconductor wafers and is also used for R&D.

Technavio’s analysts forecast the global photomask inspection market to grow at a CAGR of 7.05% during the period 2017-2021.

[Covered in this report]
The report covers the present scenario and the growth prospects of the global photomask inspection market for 2017-2021. To calculate the market size, the report presents a detailed picture of the market by way of study, synthesis, and summation of data from multiple sources.

The market is divided into the following segments based on geography:
• Americas
• APAC
• EMEA

Technavio’s report, Global Photomask Inspection Market 2017-2021, has been prepared based on an in-depth market analysis with inputs from industry experts. The report covers the market landscape and its growth prospects over the coming years. The report also includes a discussion of the key vendors operating in this market.

[Key vendors]
• KLA-Tencor
• Applied Materials
• Lasertec

[Other prominent vendors]
• Carl Zeiss
• FEI (a subsidiary of Thermo Fisher Scientific)
• Hermes Microvision
• JEOL
• Nanometrics
• Nikon
• Planar
• Rudolph Technologies

[Market driver]
• Increase in number of fabs
• For a full, detailed list, view our report

[Market challenge]
• Increased inventory levels in supply chain
• For a full, detailed list, view our report

[Market trend]
• Increase in wafer size
• For a full, detailed list, view our report

[Key questions answered in this report]
• What will the market size be in 2021 and what will the growth rate be?
• What are the key market trends?
• What is driving this market?
• What are the challenges to market growth?
• Who are the key vendors in this market space?
• What are the market opportunities and threats faced by the key vendors?
• What are the strengths and weaknesses of the key vendors?

※You can request one free hour of our analyst’s time when you purchase this market report. Details are provided within the report.

【資料の目次】

Table of Contents
PART 01: Executive summary

PART 02: Scope of the report

PART 03: Research Methodology

PART 04: Introduction
• Key market highlights
• Photomask inspection: Overview

PART 05: Market landscape

PART 06: Market overview
• Technology type
• End-users
• Market size and forecast
• Five forces analysis

PART 07: Market segmentation by technology type
• Market overview
• Global photomask inspection market by optical inspection
• Global photomask inspection market by e-beam inspection

PART 08: Market segmentation by end-user
• Market overview
• Global photomask inspection market by foundries
• Global photomask inspection market by IDMs

PART 09: Geographical segmentation
• Market overview
• Photomask inspection market in APAC
• Photomask inspection market in Americas
• Photomask inspection market in EMEA

PART 10: Key leading countries
• Market overview
• US
• South Korea
• Taiwan
• Japan

PART 11: Market drivers
• Increase in number of fabs
• Growth of wireless computing devices
• Demand for SoC technology
• Rising demand for IoT

PART 12: Impact of drivers

PART 13: Market challenges
• High initial capital investments
• Increased inventory levels in supply chain
• High dependency on few suppliers
• Increasing complexity of photomask manufacturing process

PART 14: Impact of drivers and challenges

PART 15: Market trends
• Increase in wafer size
• Constant decrease in lithography wavelength
• Growing demand for memory devices
• Proliferation of wearable devices
• Shorter replacement cycles of electronic gadgets

PART 16: Vendor landscape
• Competitive scenario
• Other prominent vendors

PART 17: Key vendor analysis
• KLA-Tencor
• Applied Materials
• Lasertec

PART 18: Appendix
• List of abbreviations

[List of Exhibits]

Exhibit 01: Global photomask inspection market: Overview
Exhibit 02: Global photomask inspection market 2016-2021 ($ millions)
Exhibit 03: Five forces analysis
Exhibit 04: Global photomask inspection market by technology type 2016-2021 (% share)
Exhibit 05: Global photomask inspection market by optical inspection 2016-2021 ($ millions)
Exhibit 06: Global photomask inspection market by e-beam inspection 2016-2021 ($ millions)
Exhibit 07: Global photomask inspection market by end-users 2016-2021 (% revenue share)
Exhibit 08: Global photomask inspection market by foundries 2016-2021 ($ millions)
Exhibit 09: Global photomask inspection market by IDMs 2016-2021 ($ millions)
Exhibit 10: Global photomask inspection market by region 2016-2021 (% revenue share)
Exhibit 11: Photomask inspection market in APAC 2016-2021 ($ millions)
Exhibit 12: Photomask inspection market in Americas 2016-2021 ($ millions)
Exhibit 13: Photomask inspection market in EMEA 2016-2021 ($ millions)
Exhibit 14: Global photomask inspection market: Key leading countries
Exhibit 15: Construction plans of fabs
Exhibit 16: Market share of wafers by size: 2016-2021 (%)
Exhibit 17: Impact of drivers
Exhibit 18: Impact of drivers and challenges
Exhibit 19: Evolution of wafer size
Exhibit 20: CAGR of 3D NAND and DRAM 2016-2021
Exhibit 21: Other prominent vendors
Exhibit 22: Recent developments
Exhibit 23: Recent developments
Exhibit 24: Recent developments



【掲載企業】

KLA-Tencor, Applied Materials, Lasertec, Carl Zeiss, FEI (a subsidiary of Thermo Fisher Scientific), Hermes Microvision, JEOL, Nanometrics, Nikon, Planar and Rudolph Technologies.

【資料のキーワード】

フォトマスク検査、フォトマスク検査装置

【調査方法】

一次資料による調査(業界専門家、ベンダー、代理店、顧客等を対象にしたデプスインタビュー調査など)及び二次資料による調査(Technavio独自のプラットフォーム、産業書籍、企業報告書、ニュース記事、アナリストレポート、貿易協会、政府機関発行データなど)

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